IUPUI School of Engineering and Technology

Advanced Nanomaterials and Nanomanufacturing

LAB FACILITY

Our laboratory collaborates with Argonne National Laboratory and Air Force Research Laboratory to provide world-class research environment. Equipments and experiment capability through the facilities can be found at the CNM and APS websites. Experiment resources are also provided through Nanoscale Characterization Facility and Electron Microscopy Center at Indiana University (Bloomington) and Integrated Nanosystems Development Institute (Indianapolis). Please check detail information at the linked websites.

 

Our group operates two research laboratories for micro/nanoscale lithography (Yellow-room, SL006) and for general materials / chemistry experiments (ET114). Our lab equipment is shown below:

 

NIL

4-in UV Nanoimprint (EZimprinting)

Sub-50 nm resolution

Configured for both hard and soft molds

UV aligner

8-in (200 mm) UV lithography mask aligner (OAI-200)

General UV micro-lithography for MEMS (i-line, 365 nm)

Spinner

Spin coater

 

DekTak XT stylus surface profiler

 

Plasma etcher

Plasma etcher (PX-250)

The March etcher (PX-250) for PR descum and oxygen plasma treatment.

IPL

8-in (200 mm) Photonic Sinter/Anneal System

The Xe-arc flash control system enables low temperature sintering of nanoinks for printed flexible electronics.

Laser Sensor

High power thermal laser sensor

Laser sensor for photonic sintering system calibration.

AFM

Atomic Force Microscope

Nanoscale surface topology characterization

potentiostat

Potentio/Gavanostat with EIS

Electrochemistry

Electroplating

Chemo/Bio resistive sensor tests

 

Sourcemeter

Keithelye 2400 Sourcemeter

Furnace

Muffle High Temp Furnace

Vacoven

Vacuum oven

Sonicbath

Ultrasonication Bath